UV-NIL Research Platform

Code:

A040-610

Features:

• Clamps fitting µ-Contact System allows for insertion of a UV-light source or a second microscope
• UV-light source includes a flexible light fiber of Ø=8mm with an inherent emission spectra of 315-500nm; the lamp life-time is about 1,500 hours

Note:

Spin coating and thermal baking of resists are the basic tools to handle polymer films that are recommended tools for using this system.

NIL process at a glance:

Thermal-UV-NIL is the abbreviation for thermally and ultra violet optically supported nano imprint lithography.

Process flow chart:

• SU8 resist spin coating, film thickness in the range of 10µm to 100µm
• First thermal curing 65°C/1min plus 5°C/3min
• NIL patterning at 90°C/2min using µCP2.1 platform
• UV exposure for 2min 350-420nm
• Second thermal curing 65°C/1min plus 95°C/3min

Technical Details:

• SU8 film thickness after spin coating: 35µm
• PDMS-stamp height: 10µm
• NIL process realised on Ticona-transparent foils of a thickness of 140µm so the substrate base is a flexible substrate (after imprinting the substrate was thermal stressed in 5 cycles of LN2-RT without visible damages)